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Phive has developed a breakthrough UHF Plasma Source which allows for rapid deposition of silicon over large areas

This fundamentally changes the economics of PV Solar and can lead to electricity generation at below grid rates


Plasma deposition is used to apply silcon thin films at lower temperatures to make solar panels
 
Plasma deposition equipment currently makes up for 80% of the capital costs of a PV solar manufacturing facility
 
Significant manufacturing cost reduction is needed to meet grid parity and silicon depoistion rates need to increase by an order of magnitude
 

Phive Plasma Technologies
+353 1 700 8555

DCU Invent
Glasnevin
Dublin 9